Education
- Ph.D., Chemical Engineering, University of Colorado Boulder
- B.S., Chemical Engineering, East China Normal University
Atomic layer deposition (ALD) has received much interest since it was introduced with the name atomic layer epitaxy (ALE) in the late 1970s. ÌýALD is based on sequential surface chemical reactions and is self-liming; therefore, it is an ideal technique to deposit conformal, uniform films with angstrom-level control on the surfaces of ultrafine particles. ÌýIn this project, TiO2 film is coated on nano-size magnetic particles. TiO2 is a good photocatalyst for destruction of a wide range of pollutants in wastewater and air. By integrating the benefits of surface photocatalyst with magnetic separation, the recoverable photocatalytic nano-particles are promising for environmental remediation.Ìý Platinum (Pt) doping using ALD method is also performed, in order to improve treatment efficiency, and it has been demonstrated to be very useful for increasing TiO2 photoactivity. ÌýThe ALD process and mechanism of semiconductor and metal films as well as the photocatalytic property are the emphasis of my Ph.D. study.